Deep levels introduced in n-GaN grown by the ELOG technique by high-energy electron irradiation

Autor: Goodman, S.A *, Auret, F.D, Myburg, G, Legodi, M.J, Gibart, P, Beaumont, B
Zdroj: In Materials Science & Engineering B 2001 82(1):95-97
Databáze: ScienceDirect