Superconducting flux flow transistor fabricated by an inductively coupled plasma etching technique
Autor: | Kang, Hyeong-Gon, Im, Y.-H., Ko, Seokcheol, Lim, Sung-Hun, Han, B.-S., Hahn, Y.B. |
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Zdroj: | In Physica C: Superconductivity and its applications 2004 400(3):111-116 |
Databáze: | ScienceDirect |
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