Superconducting flux flow transistor fabricated by an inductively coupled plasma etching technique

Autor: Kang, Hyeong-Gon, Im, Y.-H., Ko, Seokcheol, Lim, Sung-Hun, Han, B.-S., Hahn, Y.B.
Zdroj: In Physica C: Superconductivity and its applications 2004 400(3):111-116
Databáze: ScienceDirect