Thermal equilibrium concentrations and diffusivities of intrinsic point defects in silicon
Autor: | Okino, Takahisa *, Shimozaki, Toshitada |
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Zdroj: | In Physica B: Physics of Condensed Matter 15 December 1999 273-274:509-511 |
Databáze: | ScienceDirect |
Externí odkaz: |