Raman characterization of hydrogen ion implanted silicon: “High-dose effect”?

Autor: Ovsyannikov, Sergey V., Shchennikov, Vsevolod V., Jr, Shchennikov, Vladimir V., Ponosov, Yuri S., Antonova, Irina V., Smirnov, Sergey V.
Zdroj: In Physica B: Physics of Condensed Matter 2008 403(19):3424-3428
Databáze: ScienceDirect