Surfactant-aided supercritical carbon dioxide drying for photoresists to prevent pattern collapse
| Autor: | Lee, Min Young, Do, Kyung Min, Ganapathy, Hullathy Subban, Lo, Young Seop, Kim, Ju Jin, Choi, Sang Jun, Lim, Kwon Taek |
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| Zdroj: | In The Journal of Supercritical Fluids 2007 42(1):150-156 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect