Atomic-scale smoothing of semiconducting oxides via plasma-enabled atomic-scale reconstruction

Autor: Zhang, Yongjie, Tang, Jin, Liang, Shaoxiang, Zhao, Junlei, Hua, Mengyuan, Zhang, Chun, Deng, Hui
Zdroj: In International Journal of Machine Tools and Manufacture March 2024 196
Databáze: ScienceDirect