The FMR line width and the structure in YIG films deposited by MOD on silicon (1 0 0)

Autor: Assis, L.K.C.S., Abrão, J.E., Carvalho, A.S., Gonçalves, L.A.P., Galembeck, A., Padrón-Hernández, E.
Zdroj: In Journal of Magnetism and Magnetic Materials 15 February 2023 568
Databáze: ScienceDirect