Dopant profiling of focused ion beam milled semiconductors using off-axis electron holography; reducing artifacts, extending detection limits and reducing the effects of gallium implantation
| Autor: | Cooper, David, Ailliot, Cyril, Barnes, Jean-Paul, Hartmann, Jean-Michel, Salles, Phillipe, Benassayag, Gerard, Dunin-Borkowski, Rafal E. |
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| Zdroj: | In Ultramicroscopy 2010 110(5):383-389 |
| Databáze: | ScienceDirect |
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