Exploration of the ultimate patterning potential achievable with focused ion beams
| Autor: | Gierak, J., Bourhis, E., Faini, G., Patriarche, G., Madouri, A., Jede, R., Bruchhaus, L., Bauerdick, S., Schiedt, B., Biance, A.L., Auvray, L. |
|---|---|
| Zdroj: | In Ultramicroscopy 2009 109(5):457-462 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect