Fabrication of planar cobalt electrodes separated by a sub-10 nm gap using high resolution electron beam lithography with negative PMMA
| Autor: | Ressier, L., Grisolia, J., Martin, C., Peyrade, J.P., Viallet, B., Vieu, C. |
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| Zdroj: | In Ultramicroscopy 2007 107(10):985-988 |
| Databáze: | ScienceDirect |
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