Application of clean oxidation technology using H2O2 for simultaneous removal of sulfur and organic substances in the Bayer process
| Autor: | Li, Mengnan, Liu, Zhanwei, Yan, Hengwei, Ma, Wenhui, Liu, Shuxin |
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| Zdroj: | In Hydrometallurgy November 2024 229 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect