New octahedral Ta(V) hydrazido-substituted compounds for atomic layer deposition: Syntheses, X-ray diffraction structures of TaCl(NMe 2) 3[N(TMS)NMe 2] and Ta(NMe 2) 4[N(TMS)NMe 2], and fluxional behavior of the amido and hydrazido ligands in solution

Autor: Huang, Shih-Huang, Pilvi, Tero, Wang, Xiaoping, Leskelä, Markku, Richmond, Michael G.
Zdroj: In Polyhedron 2010 29(7):1754-1759
Databáze: ScienceDirect
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