High-temperature atomic layer deposition of silicon oxide films using Tris(dimethylamino)silane and ozone
| Autor: | Kim, Okhyeon, Choi, Yoonho, Kim, Changgyu, Kim, Hye-Lee, Lee, Won-Jun |
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| Zdroj: | In Ceramics International 15 November 2024 50(22) Part A:45044-45051 |
| Databáze: | ScienceDirect |
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