Investigating the optimum parameters of a negative photoresist to prepare a V-grooved diffraction grating on Si using photolithography and reactive ion etching techniques
| Autor: | Al-Hadeethi, Yas, Al-Mujtabi, A., Al-Marzouki, Fahd M., Mahmoud, Alaa Y., Umar, Ahmad, Abdel-Daiem, A.M., Ansari, Mohammad Shahnawaze |
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| Zdroj: | In Ceramics International 15 April 2021 47(8):10705-10715 |
| Databáze: | ScienceDirect |
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