Thickness dependent microstructural and electrical properties of TiN thin films prepared by DC reactive magnetron sputtering

Autor: Liang, Hailong, Xu, Jin, Zhou, Dayu, Sun, Xu, Chu, Shichao, Bai, Yizhen
Zdroj: In Ceramics International 1 February 2016 42(2) Part A:2642-2647
Databáze: ScienceDirect