Sparse identification modeling and predictive control of wafer temperature in an atomic layer etching reactor
| Autor: | Ou, Feiyang, Abdullah, Fahim, Wang, Henrik, Tom, Matthew, Orkoulas, Gerassimos, Christofides, Panagiotis D. |
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| Zdroj: | In Chemical Engineering Research and Design February 2024 202:1-11 |
| Databáze: | ScienceDirect |
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