Chemical vapour deposition of MoS 2 coatings using the precursors MoCl 5 and H 2S
| Autor: | Endler, I. *, Leonhardt, A., König, U., van den Berg, H., Pitschke, W., Sottke, V. |
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| Zdroj: | In Surface & Coatings Technology 1999 120:482-488 |
| Databáze: | ScienceDirect |
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