When magnetron sputtering deposition meets machine learning: Application to process anomaly detection
Autor: | Delchevalerie, Valentin, de Moor, Nicolas, Rassinfosse, Louis, Haye, Emile, Frenay, Benoît, Lucas, Stéphane |
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Zdroj: | In Surface & Coatings Technology 15 February 2024 477 |
Databáze: | ScienceDirect |
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