When magnetron sputtering deposition meets machine learning: Application to process anomaly detection

Autor: Delchevalerie, Valentin, de Moor, Nicolas, Rassinfosse, Louis, Haye, Emile, Frenay, Benoît, Lucas, Stéphane
Zdroj: In Surface & Coatings Technology 15 February 2024 477
Databáze: ScienceDirect