Plasma deposited amorphous silicon passivation layers on InAs surfaces
Autor: | Murphy, John P., Cleveland, Erin R., Boris, David R., Johnson, Michael J., Walton, Scott G., Nolde, Jill A. |
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Zdroj: | In Surface & Coatings Technology 30 January 2024 476 |
Databáze: | ScienceDirect |
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