Reactive remote plasma sputtering of TiOx thin films and controlled growth of textured single-phase rutile using rf substrate biasing
| Autor: | Lawton, J.D., Thornley, S.A., Wakeham, S.J., Thwaites, M.J., Stolojan, V., Baker, M.A. |
|---|---|
| Zdroj: | In Surface & Coatings Technology 30 January 2024 476 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect