Boron-carbon-silicon film chemical vapor deposition by boron trichloride, dichlorosilane and monomethylsilane gases
| Autor: | Otani, Mana, Muroi, Mitsuko, Habuka, Hitoshi |
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| Zdroj: | In Surface & Coatings Technology 25 October 2022 448 |
| Databáze: | ScienceDirect |
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