Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering

Autor: Moskovkin, P., Maszl, C., Schierholz, R., Breilmann, W., Petersen, J., Pflug, A., Muller, J., Raza, M., Konstantinidis, S., von Keudell, A., Lucas, S.
Zdroj: In Surface & Coatings Technology 25 July 2021 418
Databáze: ScienceDirect