Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering
Autor: | Moskovkin, P., Maszl, C., Schierholz, R., Breilmann, W., Petersen, J., Pflug, A., Muller, J., Raza, M., Konstantinidis, S., von Keudell, A., Lucas, S. |
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Zdroj: | In Surface & Coatings Technology 25 July 2021 418 |
Databáze: | ScienceDirect |
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