Surface modification of silicon oxycarbide films produced by remote hydrogen microwave plasma chemical vapour deposition from tetramethyldisiloxane precursor
| Autor: | Uznanski, Pawel, Glebocki, Bartosz, Walkiewicz-Pietrzykowska, Agnieszka, Zakrzewska, Joanna, Wrobel, Aleksander M., Balcerzak, Jacek, Tyczkowski, Jacek |
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| Zdroj: | In Surface & Coatings Technology 25 September 2018 350:686-698 |
| Databáze: | ScienceDirect |
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