Regulating the uniformity of DLC films in ECR plasma with negative substrate biasing
| Autor: | Deng, Q.Y., Wang, C.M., Zhang, T.F., Yang, Wenmao, Li, Xueyuan, Huang, N., Leng, Y.X. |
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| Zdroj: | In Surface & Coatings Technology 15 May 2019 365:15-23 |
| Databáze: | ScienceDirect |
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