Influence of deposition conditions on mechanical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method
| Autor: | Grenadyorov, A.S., Solovyev, А.А., Oskomov, K.V., Sypchenko, V.S. |
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| Zdroj: | In Surface & Coatings Technology 15 September 2018 349:547-555 |
| Databáze: | ScienceDirect |
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