Atmospheric pressure plasma etching of silicon dioxide using diffuse coplanar surface barrier discharge generated in pure hydrogen
| Autor: | Krumpolec, Richard, Čech, Jan, Jurmanová, Jana, Ďurina, Pavol, Černák, Mirko |
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| Zdroj: | In Surface & Coatings Technology 15 January 2017 309:301-308 |
| Databáze: | ScienceDirect |
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