Deposition of rutile TiO2 films by pulsed and high power pulsed magnetron sputtering
| Autor: | Schönberger, W., Bartzsch, H., Schippel, S., Bachmann, T. |
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| Zdroj: | In Surface & Coatings Technology 15 May 2016 293:16-20 |
| Databáze: | ScienceDirect |
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