Adjustment of plasma properties in magnetron sputtering by pulsed powering in unipolar/bipolar hybrid pulse mode

Autor: Barth, Stephan, Bartzsch, Hagen, Glöß, Daniel, Frach, Peter, Gittner, Matthias, Labitzke, Rainer
Zdroj: In Surface & Coatings Technology 25 March 2016 290:73-76
Databáze: ScienceDirect