Adjustment of plasma properties in magnetron sputtering by pulsed powering in unipolar/bipolar hybrid pulse mode
Autor: | Barth, Stephan, Bartzsch, Hagen, Glöß, Daniel, Frach, Peter, Gittner, Matthias, Labitzke, Rainer |
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Zdroj: | In Surface & Coatings Technology 25 March 2016 290:73-76 |
Databáze: | ScienceDirect |
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