Effective phase control of silicon films during high-rate deposition in atmospheric-pressure very high-frequency plasma: Impacts of gas residence time on the performance of bottom-gate thin film transistors
| Autor: | Kakiuchi, H., Ohmi, H., Yamada, T., Hirano, A., Tsushima, T., Lin, W., Yasutake, K. |
|---|---|
| Zdroj: | In Surface & Coatings Technology 15 November 2013 234:2-7 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect