Growth of lanthanide-doped YF3 thin films by pulsed liquid injection MOCVD: Influence of deposition parameters on film microstructure
| Autor: | Payrer, E.L., Almeida, R.M., Jimenez, C., Szkutnik, P.-D., Deschanvres, J.-L. |
|---|---|
| Zdroj: | In Surface & Coatings Technology 15 September 2013 230:22-27 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect