Deposition of undoped and H doped WOx (x ≤ 3) films in a hot-wire atomic layer deposition system without the use of tungsten precursors
| Autor: | Kostis, I., Vasilopoulou, M., Papadimitropoulos, G., Stathopoulos, N., Savaidis, S., Davazoglou, D. |
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| Zdroj: | In Surface & Coatings Technology 15 September 2013 230:51-58 |
| Databáze: | ScienceDirect |
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