Effect of VHF excitation frequency on localized deposition of silicon in non-equilibrium-plasma-enhanced CVD by an under-expanded supersonic jet

Autor: Kuribayashi, Shizuma, Tsunekawa, Yoshihiro, Akahori, Shoji, Ando, Daisuke, Nakamura, Jiro, Nishida, Satoshi, Muta, Hiroshi, Takeuchi, Yoshiaki, Yamauchi, Yasuhiro, Takatsuka, Hiromu
Zdroj: In Surface & Coatings Technology 25 June 2013 225:75-78
Databáze: ScienceDirect
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