Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering
| Autor: | Stranak, Vitezslav, Herrendorf, Ann-Pierra, Wulff, Harm, Drache, Steffen, Cada, Martin, Hubicka, Zdenek, Tichy, Milan, Hippler, Rainer |
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| Zdroj: | In Surface & Coatings Technology 15 May 2013 222:112-117 |
| Databáze: | ScienceDirect |
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