Structural and morphological characterization WCxNy thin films grown by pulsed vacuum arc discharge in an argon–nitrogen atmosphere
| Autor: | Ospina-Ospina, R., Jurado, J.F., Vélez, J.M., Arango, P.J., Salazar-Enríquez, C., Restrepo-Parra, E. |
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| Zdroj: | In Surface & Coatings Technology 25 December 2010 205(7):2191-2196 |
| Databáze: | ScienceDirect |
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