The effect of methane dose and post annealing treatment on the formation of nano β-SiC buried layer in the silicon

Autor: Dibaji, H., Larijani, M.M., Novinrooz, A., Salehkootahi, M., Afzalzadeh, R., Noroozian, Sh.
Zdroj: In Surface & Coatings Technology 2009 203(17):2514-2520
Databáze: ScienceDirect