Atomic layer etching of (100)/(111) GaAs with chlorine and low angle forward reflected Ne neutral beam
| Autor: | Lim, Woong Sun, Park, Sang Duk, Park, Byoung Jae, Yeom, Geun Young |
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| Zdroj: | In Surface & Coatings Technology 30 August 2008 202(22-23):5701-5704 |
| Databáze: | ScienceDirect |
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