Interface structure of microcrystalline silicon deposited by inductive coupled plasma using internal low inductance antenna
| Autor: | Kaki, H., Tomyo, A., Takahashi, E., Hayashi, T., Ogata, K., Ebe, A., Takenaka, K., Setsuhara, Y. |
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| Zdroj: | In Surface & Coatings Technology 30 August 2008 202(22-23):5672-5675 |
| Databáze: | ScienceDirect |
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