Deposition of titanium dioxide from TTIP by plasma enhanced and remote plasma enhanced chemical vapor deposition

Autor: Nizard, H., Kosinova, M.L., Fainer, N.I., Rumyantsev, Yu. M., Ayupov, B.M., Shubin, Yu. V.
Zdroj: In Surface & Coatings Technology 2008 202(17):4076-4085
Databáze: ScienceDirect