A multiscale model of the plasma assisted deposition of crystalline silicon

Autor: Rondanini, M. a, Cereda, S. b, Montalenti, F. b, Miglio, L. b, Cavallotti, C. a, ⁎
Zdroj: In Surface & Coatings Technology 2007 201(22):8863-8867
Databáze: ScienceDirect