Reactive sputtering of TiO xN y coatings by the reactive gas pulsing process: Part III: The particular case of exponential pulses
| Autor: | Martin, N., Lintymer, J., Gavoille, J., Chappé, J.M., Sthal, F., Takadoum, J., Vaz, F., Rebouta, L. |
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| Zdroj: | In Surface & Coatings Technology 2007 201(18):7733-7738 |
| Databáze: | ScienceDirect |
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