Reactive sputtering of TiO xN y coatings by the reactive gas pulsing process. Part I: Pattern and period of pulses
Autor: | Martin, N., Lintymer, J., Gavoille, J., Chappé, J.M., Sthal, F., Takadoum, J., Vaz, F., Rebouta, L. |
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Zdroj: | In Surface & Coatings Technology 2007 201(18):7720-7726 |
Databáze: | ScienceDirect |
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