Characterization of nanocrystalline TiO 2–HfO 2 thin films prepared by low pressure hot target reactive magnetron sputtering
| Autor: | Domaradzki, J., Kaczmarek, D., Prociow, E.L., Borkowska, A., Kudrawiec, R., Misiewicz, J., Schmeisser, D., Beuckert, G. |
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| Zdroj: | In Surface & Coatings Technology 2006 200(22):6283-6287 |
| Databáze: | ScienceDirect |
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