Growth of CrN x films by DC reactive magnetron sputtering at constant N 2/Ar gas flow

Autor:	Forniés, E., Escobar Galindo, R., Sánchez, O., Albella, J.M.
Zdroj:	In Surface & Coatings Technology 2006 200(20):6047-6053
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect