Formation of amine groups by plasma enhanced chemical vapor deposition and its application to DNA array technology

Autor: Jung, Donggeun, Yeo, Sanghak, Kim, Jinmo, Kim, Bongjun, Jin, Bohwan, Ryu, Doug-Young
Zdroj: In Surface & Coatings Technology 2006 200(9):2886-2891
Databáze: ScienceDirect