δ-Bi 2O 3 thin films deposited on dense YSZ substrates by CVD method under atmospheric pressure for intermediate temperature SOFC applications
| Autor: | Takeyama, T., Takahashi, N., Nakamura, T., Itoh, S. |
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| Zdroj: | In Surface & Coatings Technology 2006 200(16):4797-4801 |
| Databáze: | ScienceDirect |
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