Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution
| Autor: | Iliescu, Ciprian *, Jing, Ji, Tay, Francis E.H., Miao, Jianmin, Sun, Tietun |
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| Zdroj: | In Surface & Coatings Technology 2005 198(1):314-318 |
| Databáze: | ScienceDirect |
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