Indium phosphide nanocrystals formed in silica by sequential ion implantation

Autor: Denmark, D., Ueda, A., Shao, C.L., Wu, M.H., Mu, R. *, White, C.W., Vlahovic, B., Muntele, C.I., Ila, D., Liu, Y.C. *
Zdroj: In Surface & Coatings Technology 2005 196(1):123-129
Databáze: ScienceDirect