Experimental characterization of the deposition of silicon suboxide films in a radiofrequency magnetron reactive sputtering system

Autor: van Hattum, E.D. *, Palmero, A., Arnoldbik, W.M., Habraken, F.H.P.M.
Zdroj: In Surface & Coatings Technology 2004 188:399-403
Databáze: ScienceDirect