Experimental characterization of the deposition of silicon suboxide films in a radiofrequency magnetron reactive sputtering system
Autor: | van Hattum, E.D. *, Palmero, A., Arnoldbik, W.M., Habraken, F.H.P.M. |
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Zdroj: | In Surface & Coatings Technology 2004 188:399-403 |
Databáze: | ScienceDirect |
Externí odkaz: |