Expanding thermal plasma for fast deposition of scratch-resistant SiC xH yO z films

Autor: Barrell, Y. a, Creatore, M. a, Schaepkens, M. b, Iacovangelo, C.D. b, Miebach, T. b, van de Sanden, M.C.M. a, *
Zdroj: In Surface & Coatings Technology 2004 180:367-371
Databáze: ScienceDirect