Optical emission study of CH 4+CHF 3 ECR plasma and properties of a-C:F:H films
| Autor: | Xin, Y *, Ning, Z.Y, Ye, C, Lu, X.H, Xiang, S.L, Du, W, Huang, S, Chen, J, Cheng, S.H |
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| Zdroj: | In Surface & Coatings Technology 2003 173(2):172-177 |
| Databáze: | ScienceDirect |
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